Nikon Corporation (Kazuo Ushida, President, Chiyoda-ku, Tokyo) today announced the release of the new FPD lithography system FX-68S.
The FX-68S is an optimal FPD lithography system for manufacturing high definition organic light emitting diode (OLED) panels and LCD panels for the latest and sophisticated mobile devices, such as smartphones.
|Product name||FPD Lithography System FX-68S|
|Sales launch||March 2016|
With the growing popularity of high definition panels for sophisticated mobile devices, such as smartphones, the market is demanding a lithography system that supports Gen 6 plate size with higher resolution and accuracy.
The FX-68S is a lithography system that supports the production of high definition small and medium-sized panels using a Gen 6 plate. Its scanner method enables improved productivity as well as high resolution and high alignment accuracy.
- High ResolutionWhile succeeding the traditional multi-lens system, Nikon has developed a new i-line projection lens that enables higher resolution. In addition, we developed an innovative correction system that takes advantage of our multi-lens system in large plate exposure. In this system, the focal surface follows the inclination change in a plate. This enabled the high volume production of panels with a high resolution of 1.5μm (L/S*) in a G6 plate.
- *L/S：Line and Space
- High Alignment AccuracyThe new interferometer system for position measurement is designed to realize high accuracy alignment by enhancing measurement accuracy and position control performance.
- High ThroughputWith the new projection lens and stage, the FX-68S achieved high throughput of 78 plates per hour by enabling 4-scan on a Gen 6 plate.
|Resolution (L/S)||1.5 μm (i-line)|
|Alignment Accuracy||≤±0.35 μm|
|Maximum Plate Size||1,500 mm x 1,850 mm|
|Takt Time||46 sec./plate